| The Imprio 1100 Precision Lithography System represents the next generation in fully automated nano-imprint lithography; combining the resolution and CD control of e-beam with the throughput of a mask aligner.
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| This tool is ideal for device and process prototyping and pre-production at the 65nm node, 45nm node and beyond, as well as for alignment sensitive applications such as thin film heads and molecular electronics.
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| This affordable, research-oriented nano-imprinter is for universities and small labora tories. The tool is specifically targeted towards researchers studying basic science in the area of nanotechnology
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| This mid-level system is ideally suited for use in small scale manufacturing facilities, corporate R&D centers, and government laboratories exploring nano-device fabrication.
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