Gazillion (EM-Suite Option)

New Demo Videos

• Gazillion and PanOPC
• Using Gazillion to generate 3D Alt. PSM topogrpahy

Gazillion is a layout editor/viewer/simulator

• import layout from GDS-II or from .dsa/.dscript file
• export subsections of the layout as polygons or as pixel-mapped topography to create 2D and 3D mask geometry
• export to GDS-II
• view a multi-layer mask layout
• clear, crop, cut, copy paste layout
• run mask/aerial/resist simulations right from the layout, import simulation results into the layout as layers
• run OPC correction (requires PanOPC option)
• set run-time measurements right on the layout, export measurements to "Run-Time" measurements in Aerial and Resist
• view GDS-II hierarchy, select sub-structures

PanOPC (EM-Suite Option)

• Apply Model-Based Optical Proximity Correction algorithms to imported GDS-II layouts
• Export corrected layout (back to GDS-II, correctly inserted into hierarchy)
• Uses EM-Suite as the "in-line" simulator (rigorous or scalar, aerial image or resist image)
• Set up OPC parameters as variables - tune the OPC algorithms to particular layouts
• Suitable for small areas (NOT full chip yet!)
• Tiling and stitching for larger areas - works with SimRunner

Topography Editor (EM-Suite Core)

• Edit 2D complex transmission function ("thin" mask)
• Edit 3D topography ("thick" mask)
• Build topography from "blocks"
• Ability to set all topographical parameters as variables
• Import GDS-II, surfaces, and 3D bit-maps
• Front end to rigorous topography simulators (TEMPESTpr2, TEMPESTpr1, WASP) and scalar topography simulator (Stack/Kirchhoff)

Aerial Imaging (EM-Suite Core)

• Full-vector aerial imaging
• Complete control over polarization
• Image into air, immersion liquid or film stack
• Predefined or user-customizable illuminations
• "Flashlight" feature lets user see effects of individual source integration points
• All imaging parameters can be set as variables

Resist (EM-Suite Option)

• Solves 3D diffusion-reaction and develop equation
• Output resist profiles, acid & base concentrations, de-protection levels
• Add temperature dependence, user-defined PEB temperature profiles
• All resist parameters can be set as variables
• Unencrypted resist parameter sets from other commercial simulators can be easily converted

Visual/Metrology (EM-Suite Core)

• Plot and measure 1D, 2D and 3D data
• Matrix plot
• measure CD, ILS, contrast, resist height etc.
• Generate Bossung curves, process windows (rectangular, elliptical) and Exposure Latitude vs. DOF curves
• Powerful Data post-processing with Data Series Calculator
• Import and export text
• Apply polynomial curve fit to noisy, off-grid data (useful form importing measured CD FEM data)

Kirchhoff (EM-Suite Core)

• scalar ("thin") mask model

TEMPESTpr2 (EM-Suite Option)

• 3D rigorous FDTD solution to the Maxwell equations
• Periodic boundary conditions in X & Y, isolated in Z
• Continuous angle of incidence allowed

SOAPI (EM-Suite Option)

• Scripting and Open API
• Interface EM-Suite simulators with your own code
• API gives access to simulators and metrology and plotting subroutines

SimRunner (EM-Suite Option)

• Distribute runs across computers on the network

WASP (EM-Suite Option)

• 30X to 40X faster than TEMPESTpr2!!!  Suitable for ArF phase shift masks lithography applications (CPL, Alt. PSM, Att. PSM etc.)
• Excellent for small area rigorous model-based OPC with PanOPC

Stack/MatMan (EM-Suite Option)

• Stand alone film-stack analysis
• Convert 3D "thick" topographies to 2D "thin" complex transmission (then simulate with Kirchhoff)
• Library of material indices or refraction through wavelength