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Energetiq is a developer and manufacturer of short wavelength light sources for use in advanced scientific and engineering applications.

Technology

Energetiq's light sources are based on new technology that generates high brightness and high power light in the 1nm to 450nm range with high reliability in a compact package

Applications

Energetiq's light sources can be used for; DUV cleaning and photprocessing,EUV Lithography, Metrology and Resist development, Soft X-Ray Microscopy and a variety of applications where synchrotron radiation has traditionally been used


 

Saturn™  DUV Lamp Subsystem

 
  

Electrodeless 10 kW DUV Light Source

                                     

The fully integrated Saturn™ DUV (Deep Ultra Violet) Lamp Subsystem from Energetiq Technology provides maximum short-wavelength DUV light for uniform illumination across a 300mm wafer or substrate in cleaning and photoprocessing applications. Short-wavelength DUV light provides energy for thin-film and surface processes without electrical charge or heating damage.

The Saturn lamp subsystem uses a unique inductive coupling technology* to drive an electrical current in a Xenon/Mercury plasma located inside an electrodeless torodial bulb. The electrical current heats and sustains the plasma, causing a high intensity emission of DUV radiation. The unique coupling technology, in conjunction with the particular gas mixture chosen by Energetiq, lead to maximum DUV output at wavelengths down to 170nm.

The Energetiq Saturn lamp subsystem provides the highest power density available today at the lowest cost of ownership. The Saturn subsystem is a compact integrated package that features an on-board power supply, integral water cooling to avoid cleanroom-unfriendly forced-air cooling, and recirculating nitrogen cooling to eliminate toxic ozone production. In addition, the long-life low-temperature bulb minimizes wafer or substrate heating, allowing greater process flexibility.

* Patent Pending


Features & Benefits

- High Intensity 10 kW DUV Lamp

- Unique Inductive Coupling Technology

- More short-wavelength DUV

- Long-life Electrodeless Toroidal Bulb ->500 mW/cm2 from 170-400nm

- Uniform Illumination of 300mm Wafer

- Low Bulb Temperature

- Minimizes wafer heating

- Increases process flexibility

- Fully Integrated Subsystem

- All water cooled

- No ozone production

- Integrated power supply

- Integrated DUV reflector for max. DUV output

Applications

- UV Cleaning

- Photoresist Processing

- Research


EQ-10 Electrodeless Z-Pinch EUV
& Soft X-Ray Source
 

Features & Benefits

* Unique electrodeless design - Low debris / low consumable cost

* Up to 10W into 2pi using Xenon - Sufficient power for a wide variety of applications

* 2-4nm Soft X-Rays produced using Nitrogen - Enables tabletop SXR microscope applications

* Up to 1kHz repetition rate - Continuous or burst mode

* Small plasma size - Below 1mm diameter

* Flexible optical interface - To suit customer application

* Cost-effective and compact - Low cost per EUV & SXR watt - Small footprint

Applications

* EUV Metrology

* EUV Resist Development

* Defect Inspection

* EUV & Soft X-Ray Microscopy

Product Description

Researchers into the emerging technology of EUV lithography need a source of EUV photons for a variety of applications. Existing sources of light are often too low in power, unreliable in operation, large, costly and complex. Soft X-rays (SXR) for water-window microscopy are not readily available today outside synchrotron facilities.

The EQ-10M is a compact, easy-to-use, reliable and cost-effective EUV & SXR light source system, based on Energetiq's unique Electrodeless Z-pinch (tm) technology using either Xenon or Nitrogen gas.

The Energetiq EQ-10M is integrated into a single 19" rack format to minimize the system footprint. The system includes the electrodeless Z-pinch source assembly, vacuum and gas sub-systems, power delivery subsystem and control electronics. The EQ-10M is capable of delivering up to 10 watts of in-band (+/- 1% BW) EUV into 2pi steradians and will run continuously at pulse repetition rates of up to 1kHz or in bursts of up to 1kHz pulses if required.

To accommodate the differing requirements of the various applications, the source operating conditions are user-adjustable. The EUV light output can be optimized for peak power or for peak brightness as required by the user. Plasma size is typically below 1mm in diameter under typical operating conditions. A simple and flexible optical interface is provided to the user on the side of the system enclosure to connect to the application equipment. Custom interfaces are available to meet specific customer requirements. The user interface operates by a color touch screen display, and incorporates menus allowing manual and automatic operation.

The EQ-10M is easy to install, requiring only electrical power, a chilled water supply, clean dry compressed air and a supply of Xenon or Nitrogen. Footprint of the system is 600mm (W) x 900mm (D). The complete system rack height is 1900mm.




For more information, please visit
www.energetiq.com
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